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Analysis of TihxOy Films Produced by Physical Vapor Deposition Method

dc.contributor.authorUrbonavicius, Marius
dc.contributor.authorTuckute, Simona
dc.contributor.authorKarazhanov, Smagul
dc.contributor.authorLelis, Martynas
dc.date.accessioned2022-11-30T10:38:28Z
dc.date.available2022-11-30T10:38:28Z
dc.date.created2022-11-28T10:01:10Z
dc.date.issued2022
dc.identifier.citationApplied Sciences. 2022, 12 (21), .en_US
dc.identifier.issn2076-3417
dc.identifier.urihttps://hdl.handle.net/11250/3034995
dc.language.isoengen_US
dc.rightsNavngivelse 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/deed.no*
dc.titleAnalysis of TihxOy Films Produced by Physical Vapor Deposition Methoden_US
dc.title.alternativeAnalysis of TihxOy Films Produced by Physical Vapor Deposition Methoden_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionpublishedVersionen_US
dc.rights.holder© 2022 by the authors. Licensee MDPI, Basel, Switzerland.en_US
dc.source.pagenumber9en_US
dc.source.volume12en_US
dc.source.journalApplied Sciencesen_US
dc.source.issue21en_US
dc.identifier.doi10.3390/app122110811
dc.identifier.cristin2082127
dc.relation.projectNorges forskningsråd: 300107en_US
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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Except where otherwise noted, this item's license is described as Navngivelse 4.0 Internasjonal