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dc.contributor.authorCheng, Xuemei
dc.contributor.authorRepo, Paivikki
dc.contributor.authorHaug, Halvard
dc.contributor.authorPerros, Alexander Pyymaki
dc.contributor.authorMarstein, Erik Stensrud
dc.contributor.authorDi Sabatino Lundberg, Marisa
dc.contributor.authorSavin, Hele
dc.date.accessioned2018-02-14T12:17:22Z
dc.date.available2018-02-14T12:17:22Z
dc.date.created2017-08-09T15:00:57Z
dc.date.issued2017
dc.identifier.citationIEEE Journal of Photovoltaics. 2017, 7 (2), 479-485.nb_NO
dc.identifier.issn2156-3381
dc.identifier.urihttp://hdl.handle.net/11250/2484633
dc.language.isoengnb_NO
dc.titleSurface passivation properties of HfO2 thin film on n-Type crystalline Sinb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionsubmittedVersionnb_NO
dc.source.pagenumber479-485nb_NO
dc.source.volume7nb_NO
dc.source.journalIEEE Journal of Photovoltaicsnb_NO
dc.source.issue2nb_NO
dc.identifier.doi10.1109/JPHOTOV.2016.2645399
dc.identifier.cristin1485228
cristin.unitcode7492,1,3,0
cristin.unitnameSolenergi
cristin.ispublishedtrue
cristin.fulltextpreprint
cristin.qualitycode1


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