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MgyNi1-y(H-x) thin films deposited by magnetron co-sputtering

dc.contributor.authorMongstad, Trygve
dc.contributor.authorYou, Chang Chuan
dc.contributor.authorThøgersen, Annett
dc.contributor.authorMæhlen, Jan Petter
dc.contributor.authorPlatzer-Björkman, Charlotte
dc.contributor.authorHauback, Bjørn
dc.contributor.authorKarazhanov, Smagul
dc.date.accessioned2017-08-25T13:15:25Z
dc.date.available2017-08-25T13:15:25Z
dc.date.created2012-10-11T13:13:58Z
dc.date.issued2012
dc.identifier.citationJournal of Alloys and Compounds. 2012, 527 76-83.nb_NO
dc.identifier.issn0925-8388
dc.identifier.urihttp://hdl.handle.net/11250/2451910
dc.description© 2012 Elsevier B.V. All rights reserved.nb_NO
dc.language.isoengnb_NO
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/deed.no*
dc.titleMgyNi1-y(H-x) thin films deposited by magnetron co-sputteringnb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionacceptedVersionnb_NO
dc.source.pagenumber76-83nb_NO
dc.source.volume527nb_NO
dc.source.journalJournal of Alloys and Compoundsnb_NO
dc.identifier.doi10.1016/j.jallcom.2012.02.155
dc.identifier.cristin950076
dc.relation.projectNorges forskningsråd: 181884nb_NO
cristin.unitcode7492,1,3,0
cristin.unitcode7492,0,0,0
cristin.unitcode7492,1,1,0
cristin.unitcode7492,2,3,0
cristin.unitnameSolenergi
cristin.unitnameInstitutt for energiteknikk
cristin.unitnameEnergisystemer
cristin.unitnameFysikk
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode1


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