dc.contributor.author | Cheng, Xuemei | |
dc.contributor.author | Repo, Paivikki | |
dc.contributor.author | Haug, Halvard | |
dc.contributor.author | Perros, Alexander Pyymaki | |
dc.contributor.author | Marstein, Erik Stensrud | |
dc.contributor.author | Di Sabatino Lundberg, Marisa | |
dc.contributor.author | Savin, Hele | |
dc.date.accessioned | 2018-02-14T12:17:22Z | |
dc.date.available | 2018-02-14T12:17:22Z | |
dc.date.created | 2017-08-09T15:00:57Z | |
dc.date.issued | 2017 | |
dc.identifier.citation | IEEE Journal of Photovoltaics. 2017, 7 (2), 479-485. | nb_NO |
dc.identifier.issn | 2156-3381 | |
dc.identifier.uri | http://hdl.handle.net/11250/2484633 | |
dc.language.iso | eng | nb_NO |
dc.title | Surface passivation properties of HfO2 thin film on n-Type crystalline Si | nb_NO |
dc.type | Journal article | nb_NO |
dc.type | Peer reviewed | nb_NO |
dc.description.version | submittedVersion | nb_NO |
dc.source.pagenumber | 479-485 | nb_NO |
dc.source.volume | 7 | nb_NO |
dc.source.journal | IEEE Journal of Photovoltaics | nb_NO |
dc.source.issue | 2 | nb_NO |
dc.identifier.doi | 10.1109/JPHOTOV.2016.2645399 | |
dc.identifier.cristin | 1485228 | |
cristin.unitcode | 7492,1,3,0 | |
cristin.unitname | Solenergi | |
cristin.ispublished | true | |
cristin.fulltext | preprint | |
cristin.qualitycode | 1 | |