Blar i IFE BRAGE på forfatter "Sprouster, David"
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In-pile tensile creep of chemical vapor deposited silicon carbide at 300 °C
Koyanagi, Takaaki; Terrani, Kurt; Karlsen, Torill Marie; Andersson, Vendi; Sprouster, David; Ecker, Lynne; Katoh, Yutai (Journal article; Peer reviewed, 2019)